ʻO ka hana nui a me nā hiʻohiʻona hana:
1. Hiki ke hana i ka mana hoʻopaʻa hoʻopaʻa ʻia ka ʻāpana mika a me ka make.
2.CCD pūnaewele me ka hoʻopaʻa ʻia-loop mana no ka ʻike ana.
3. Hoʻopili i ka lipine hoʻopau ma nā huelo.
4.Duble layer slurry hiki ke uhi ʻia ma ka ʻaoʻao like o ka substrate.
5.Work pu me MES nenoaiu a managere mote ao mana no ka lako.
Ka nānā ʻana a me ka manaʻo maikaʻi:
1.Area density mika ma X/B ray no ka ʻike ma ka laina.
2.CCD pūnaewele no ka nui a me ka ʻike kīnā.
3.NG mark inkjet paʻi.
4. Ana wela ma o IR ma ka ili o electrode i loko o ka umu.
5. The mass flowmeter monitors online no ke kahe, viscosity a me ka mahana.
6.NMP noonoo ana no ka cathode umu andhumidity ike no anode umu.
Nā ʻāpana ʻenehana nui:
Slurry kūpono | LFPLCO, LMO, ternary, graphite, kalapona silika, etc |
Keʻano uhi | Ka uhi ʻana i ka extrusion |
Ka laula o ka lepo/ka manoanoa o ka lepo | Max:1400mm/Cu:min4.5um;/AL:Min9um |
Laulā Ili Laulā | Max: 1600mm |
Laulā Uila | Max: 1400mm |
ʻO ka wikiwiki o ka uhi ʻana | ≤90m/min |
Ka pololei o ke kaupaona ana | ±1% |
ʻAno hoʻomehana | Pumehana uila/wela mahu/wela ʻaila |
Nānā: Aia nā ʻāpana kikoʻī i ka ʻaelike aelike